Researcher(M/F) – Development of Plasma Etching Processes for III-V Lasers for Silicon Photonic Integration

About the position

Researcher(M/F) – Development of Plasma Etching Processes for III-V Lasers for Silicon Photonic Integration

Institution: CNRS

Research Field: Engineering

Researcher Profile: Recognised Researcher (R2)

Application Deadline: 9 Oct 2026 - 23:59 (UTC)

Job Status: Full-time

Is the job funded through the EU Research Framework Programme?: Not funded by a EU programme

Is the Job related to staff position within a Research Infrastructure?: No

This work is carried out within the framework of the IRT Nanoelec project, which aims to bring a 300 mm CMOS-compatible integrated photonics platform to technological maturity.

The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which is currently the main technological challenge, while achieving anisotropic laser sidewalls without lateral degradation of the quantum wells.

Pulsed plasma technologies, known to improve etch selectivity between materials and minimize plasma-induced damage, will be evaluated as part of this study.

Plasma etching processes will be developed on the LTM 300 mm etching reactor, equipped with pulsed plasma technology and located in the CEA/Leti cleanroom facilities.

Investigating the etching mechanisms and selectivity of InP and InGaAlAs films as a function of plasma parameters using ellipsometry, XPS and AFM.

Developing an etching process for the multilayer stack meeting the required selectivity and damage criteria, with characterization by FIB-STEM and EDX.

Transferring the developed processes to CEA/Leti.

If the morphological results are satisfactory, the developed processes will be integrated into optical demonstrator lots, enabling the performance of the patterned lasers to be evaluated.

This work will be carried out at the Laboratoire des Technologies de la Microélectronique (LTM), a joint research laboratory of CNRS and Université Grenoble Alpes (UGA) (UMR 5129), located at the CEA-LETI-MINATEC site in Grenoble, France.

Approximately 100 people work at LTM, including 30 researchers and faculty members, 18 engineers and technicians, 31 PhD students and 16 postdoctoral researchers.

The laboratory's activities lie at the interface between fundamental academic research and industrial research.

The candidate will join the PROSPECT team at LTM.

The team focuses on the development of innovative processes and materials for advanced nanoelectronic and optoelectronic devices.

Research Field: Physics

Research Field: Technology

Years of Research Experience: 1 - 4

Plasma etching and wet etching processes; material characterization (XPS, ellipsometry, AFM, electron microscopy).

Website for additional job details: https://emploi.cnrs.fr/Offres/CDD/UMR5129-MARCLO-110/Default.aspx

What you’ll bring

• Eligibility criteria
• Research Field: Engineering
• Education Level: PhD or equivalent
• Research Field: Physics
• Research Field: Technology
• Languages: FRENCH
• Level: Basic
• Years of Research Experience: 1 - 4

At a glance

Position type

Other early career

Institution

CNRS

Department

Laboratoire des Technologies de la Microélectronique (LTM)

Research group

Not stated

Location

GRENOBLE, France, FR

Supervisor / contact person

Not stated

Funding

Funding not stated
Is the job funded through the EU Research Framework Programme?: Not funded by a EU programme

Duration

Not stated

Expected start

Not stated

Vacancy reference

EURAXESS-466949

Research focus

Discipline

Physics

Research area

Semiconductors

Methods

Microscopy

Software

Python

Dates to know

Listed on FOSS Positions

28 Sep 2026

Original advertisement date

Not stated in the source

Application deadline

09 Oct 2026 · 23:59 UTC

Priority review date

Not stated

Last checked

28 Sep 2026

Last updated

28 Sep 2026

2026-10-09T23:59:00+00:00

How to apply

Application Deadline: 9 Oct 2026 - 23:59 (UTC)
Where to apply
Apply now

https://emploi.cnrs.fr/Offres/CDD/UMR5129-MARCLO-110/Default.aspx

Original sources

https://euraxess.ec.europa.eu/jobs/466949 ↗

https://emploi.cnrs.fr/Offres/CDD/UMR5129-MARCLO-110/Default.aspx ↗