Researcher (M/F): Ultrafast laser material processing of semiconductors

About the position

Researcher (M/F): Ultrafast laser material processing of semiconductors

Institution: CNRS

Department: Laboratoire Lasers, Plasmas et Procédés Photoniques

Research Field: Engineering

Researcher Profile: Recognised Researcher (R2)

Application Deadline: 15 Oct 2026 - 23:59 (UTC)

Job Status: Full-time

Is the job funded through the EU Research Framework Programme?: Not funded by a EU programme

Is the Job related to staff position within a Research Infrastructure?: No

The researcher (M/F) will work within the framework of the ANR Lamorsim project (https://anr.fr/Project-ANR-23-CE08-0029).

The main objective of this project is to develop methodologies for controlled laser-induced amorphization of silicon.

In this work, the researcher (M/F) will develop experimental configurations to induce and study the transformation of silicon.

The work includes pump-probe reflectivity measurements to investigate the melting and solidification dynamics of crystalline silicon under femtosecond laser irradiation.

The researcher (M/F) will also be responsible for implementing beam shaping techniques to produce uniform layers, as well as exploring the possibility of generating micrometer-scale amorphous volumes inside silicon, thereby opening new application fields.

The results of these ultrafast optics experiments will contribute to a better understanding of surface annealing processes, aiming for optimized control of the material's final state, taking into account its crystalline structure as well as the position and depth of the transformations.

The researcher (M/F) will be responsible for experiments using ultra-short laser pulses.

- experimental analysis and/or modeling of interactions and material responses,

- optimization of laser writing process performance (process engineering) and technological demonstrations,

- publication of one or more papers on the analysis of data collected during the project.

The LP3 laboratory is a joint research unit under the supervision of the CNRS and Aix-Marseille University.

It conducts research on the physics of pulsed laser–matter interactions to develop new photonic processes.

Research Field: Chemistry

Research Field: Physics

Years of Research Experience: 1 - 4

We are seeking a highly motivated and independent researcher (M/F) with an interest in laser science and technology, ultrafast optics, and/or materials processing.

Candidates (M/F) must have proven expertise in process engineering and shaping of ultrafast beams (beam transport and manipulation, synchronization, motion control, scanner operation, etc.).

Excellent written and spoken English is required.

Website for additional job details: https://emploi.cnrs.fr/Offres/CDD/UMR7341-DAVGRO-018/Default.aspx

Company/Institute: Laboratoire Lasers, Plasmas et Procédés Photoniques

What you’ll bring

• Eligibility criteria
• Candidates (M/F) must have proven expertise in process engineering and shaping of ultrafast beams (beam transport and manipulation, synchronization, motion control, scanner operation, etc.).
• Excellent written and spoken English is required.
• Research Field: Engineering
• Education Level: PhD or equivalent
• Research Field: Chemistry
• Research Field: Physics
• Languages: FRENCH
• Level: Basic
• Years of Research Experience: 1 - 4

At a glance

Position type

Other early career

Institution

CNRS

Department

Laboratoire Lasers, Plasmas et Procédés Photoniques

Research group

Not stated

Location

MARSEILLE 09, France, FR

Supervisor / contact person

Not stated

Funding

Funding not stated
Is the job funded through the EU Research Framework Programme?: Not funded by a EU programme

Duration

Not stated

Expected start

Not stated

Vacancy reference

EURAXESS-468215

Research focus

Discipline

Chemistry, Physics

Research area

Semiconductors

Methods

Not stated

Software

Not stated

Dates to know

Listed on FOSS Positions

28 Sep 2026

Original advertisement date

Not stated in the source

Application deadline

15 Oct 2026 · 23:59 UTC

Priority review date

Not stated

Last checked

28 Sep 2026

Last updated

28 Sep 2026

2026-10-15T23:59:00+00:00

How to apply

Application Deadline: 15 Oct 2026 - 23:59 (UTC)
The researcher (M/F) will also be responsible for implementing beam shaping techniques to produce uniform layers, as well as exploring the possibility of generating micrometer-scale amorphous volumes inside silicon, thereby opening new application fields.
Where to apply
Apply now

https://emploi.cnrs.fr/Offres/CDD/UMR7341-DAVGRO-018/Default.aspx

Original sources

https://euraxess.ec.europa.eu/jobs/468215 ↗

https://emploi.cnrs.fr/Offres/CDD/UMR7341-DAVGRO-018/Default.aspx ↗