Postdoc : Generating extreme ultraviolet light from plasma with a 2µm laser
ARCNL
Postdoc : Generating extreme ultraviolet light from plasma with a 2µm laser
Research Field: Physics » Applied physics
Researcher Profile: Recognised Researcher (R2)
Job Status: Not Applicable
Is the job funded thr...
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About the position
Postdoc : Generating extreme ultraviolet light from plasma with a 2µm laser
Research Field: Physics » Applied physics
Researcher Profile: Recognised Researcher (R2)
Job Status: Not Applicable
Is the job funded through the EU Research Framework Programme?: Not funded by a EU programme
Is the Job related to staff position within a Research Infrastructure?: No
This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application.
The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.
In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms.
Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl.
Lett. 123, (2023)] – a concept that is most relevant for the current vacancy.
The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age.
The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses.
You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry.
ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), the University of Groningen (UG), and the semiconductor equipment manufacturer ASML.
The position is intended as full-time (40 hrs / week, 12 months / year) appointment in the service of the Netherlands Foundation for Scientific Research Institutes (NWO-I) for the duration of up to 3 years, with a starting salary of €4,552 gross per month, scale 10 (CAO-OI), and a range of employment benefits.
A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants.
We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
https://www.academictransfer.com/en/jobs/363461/postdoc-generating-extreme-ultr…
What you’ll bring
- You have (or will soon obtain) a PhD in (Applied) Physics.
- Strong verbal and written communication skills in English are required.
- We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
- Knowledge of experimental laser and/or plasma physics is an asset, especially if combined with strong hands-on laboratory skills.
- Programming experience, particularly in Python, is welcomed.
At a glance
- Position type
- Postdoc
- Institution
- ARCNL
- Department
- Not stated
- Research group
- Not stated
- Location
- Amsterdam, Netherlands, NL
the Amsterdam Science Park, Netherlands, NL
the service of the, Netherlands, NL - Supervisor / contact person
- Dr. Oscar Versolato
- Funding
- Salaried
Is the job funded through the EU Research Framework Programme?: Not funded by a EU programme
The position is intended as full-time (40 hrs / week, 12 months / year) appointment in the service of the Netherlands Foundation for Scientific Research Institutes (NWO-I) for the duration of up to 3 years, with a starting salary of €4,552 gross per month, scale 10 (CAO-OI), and a range of employment benefits. - Duration
- Not stated
- Expected start
- Not stated
- Vacancy reference
- EURAXESS-461410
Research focus
- Discipline
- Chemistry, Physics
- Research area
- Semiconductors
- Methods
- Not stated
- Software
- Python
Dates to know
- Listed on FOSS Positions
- 28 Sep 2026
- Original advertisement date
- Not stated in the source
- Application deadline
- 20 Feb 2027 · 15:54 UTC
- Priority review date
- Not stated
- Last checked
- 28 Sep 2026
- Last updated
- 28 Sep 2026
2027-02-20T15:54:03+00:00
How to apply
Application Deadline: 20 Feb 2027 - 15:54 (UTC)
This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.
The position is intended as full-time (40 hrs / week, 12 months / year) appointment in the service of the Netherlands Foundation for Scientific Research Institutes (NWO-I) for the duration of up to 3 years, with a starting salary of €4,552 gross per month, scale 10 (CAO-OI), and a range of employment benefits. A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants. ARCNL assists any new foreign researchers with housing, subject to availability, and visa applications and compensates their transport costs and furnishing expenses.
Application
Please send your:
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
Where to apply
Apply now
https://www.academictransfer.com/en/jobs/363461/postdoc-generating-extreme-ultraviolet-light-from-plasma-with-a-2m-laser/apply/
Contact: versolato@arcnl.nlPhone: +31 (0)20-851 7100